Invention Grant
US08795778B2 Photo-patterning using a translucent cylindrical master to form microscopic conductive lines on a flexible substrate
有权
使用半透明的圆柱形母版进行光图案化，以在柔性基底上形成微观导电线
- Patent Title: Photo-patterning using a translucent cylindrical master to form microscopic conductive lines on a flexible substrate
- Patent Title (中): 使用半透明的圆柱形母版进行光图案化，以在柔性基底上形成微观导电线
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Application No.: US13979627Application Date: 2012-10-12
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Publication No.: US08795778B2Publication Date: 2014-08-05
- Inventor: Robert J. Petcavich , Ed S. Ramakrishnan , Daniel K. Van Ostrand
- Applicant: Unipixel Displays, Inc.
- Applicant Address: US TX The Woodlands
- Assignee: Unipixel Displays, Inc.
- Current Assignee: Unipixel Displays, Inc.
- Current Assignee Address: US TX The Woodlands
- International Application: PCT/US2012/059881 WO 20121012
- International Announcement: WO2013/059078 WO 20130425
- Main IPC: B05D3/10
- IPC: B05D3/10 ; B05D1/18
Abstract:
A method includes forming a master embossing roller to have a predetermined pattern, coating a flexible unpatterned substrate with a catalyst coating layer and forming a corresponding pattern in the coated substrate using the master embossing roller to thereby form a patterned substrate. The method may also include electrolessly plating the patterned substrate.
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