Invention Grant
- Patent Title: Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
- Patent Title (中): 在带电粒子源和带电粒子分析仪之间的一级带电粒子偏转透镜的气体分析的质谱仪偏离偏转透镜的中心轴线
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Application No.: US13155890Application Date: 2011-06-08
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Publication No.: US08796620B2Publication Date: 2014-08-05
- Inventor: Philip Neil Shaw , Jonathan Hugh Batey
- Applicant: Philip Neil Shaw , Jonathan Hugh Batey
- Applicant Address: US MA Andover
- Assignee: MKS Instruments, Inc.
- Current Assignee: MKS Instruments, Inc.
- Current Assignee Address: US MA Andover
- Agency: Proskauer Rose LLP
- Main IPC: H01J3/14
- IPC: H01J3/14 ; H01J49/06
Abstract:
Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.
Public/Granted literature
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