Invention Grant
- Patent Title: Charged particle beam drawing method and apparatus
- Patent Title (中): 带电粒子束的绘制方法和装置
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Application No.: US12725676Application Date: 2010-03-17
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Publication No.: US08796650B2Publication Date: 2014-08-05
- Inventor: Jun Yashima
- Applicant: Jun Yashima
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-067664 20090319
- Main IPC: H01J37/302
- IPC: H01J37/302 ; H01J37/317

Abstract:
A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle beam gun is passed through the opening of the first forming aperture member, a second forming aperture member having an opening, wherein the charged particle beam passed through the first forming aperture member is passed through the opening of the second forming aperture member, a movable stage for supporting a workpiece, wherein patterns corresponding to figures in a drawing data are drawn on the workpiece by the charged particle beam passed through the second forming aperture member, and a drawing data correcting process portion for moving the figures in the drawing data on the basis of positions in the opening of the second forming aperture, where the charged particle beam for drawing the patterns is passed through.
Public/Granted literature
- US20100237253A1 CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS Public/Granted day:2010-09-23
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