Invention Grant
- Patent Title: Transfer medium manufacturing method, transfer method, transfer medium manufacturing apparatus, and transfer apparatus
- Patent Title (中): 转印介质制造方法，转印方法，转印介质制造装置和转印装置
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Application No.: US12852890Application Date: 2010-08-09
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Publication No.: US08800627B2Publication Date: 2014-08-12
- Inventor: Kunihiko Matsuhashi
- Applicant: Kunihiko Matsuhashi
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2009-185927 20090810
- Main IPC: B32B41/00
- IPC: B32B41/00 ; B05C11/00
Abstract:
A transfer medium manufacturing method for manufacturing a transfer medium in which a foil forming recording material containing metallic particles capable of being transferred onto a target has been applied to a base material includes: applying the foil forming recording material to the base material; and smoothing the surface of the foil forming recording material applied to the base material in the applying, the foil forming recording material being in a partially-melted state.
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