Invention Grant
- Patent Title: Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
- Patent Title (中): 检测方法和装置，光刻设备，光刻处理单元和器件制造方法
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Application No.: US13458116Application Date: 2012-04-27
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Publication No.: US08804123B2Publication Date: 2014-08-12
- Inventor: Wolfgang Max Adolf Bernhard Osten , Karsten Frenner , Bartosz Jan Bilski
- Applicant: Wolfgang Max Adolf Bernhard Osten , Karsten Frenner , Bartosz Jan Bilski
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G01J4/00
- IPC: G01J4/00
Abstract:
Determining line edge roughness comprises reflecting at least one radiation beam off the object, observing a first optical response signature from a beam reflected from the object, or a component thereof, being polarized with an electrical vector in a first orientation relative to the object; and observing a second optical response signature from a beam reflected from the object, or a component thereof, being polarized with an electrical vector in a second orientation relative to the object. Line edge roughness can then be determined from the two optical response signatures.
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