Invention Grant
- Patent Title: Light processing system and method
- Patent Title (中): 光处理系统和方法
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Application No.: US13518822Application Date: 2010-12-24
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Publication No.: US08810796B2Publication Date: 2014-08-19
- Inventor: Paul Byron Hays , David Michael Zuk
- Applicant: Paul Byron Hays , David Michael Zuk
- Applicant Address: US MI Ann Arbor
- Assignee: Michigan Aerospace Corporation
- Current Assignee: Michigan Aerospace Corporation
- Current Assignee Address: US MI Ann Arbor
- Agency: Morris, Manning & Martin, LLP
- Agent Juan Carlos A. Marquez
- International Application: PCT/US2010/062111 WO 20101224
- International Announcement: WO2011/079323 WO 20110630
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G01J3/45 ; G01C3/08

Abstract:
A portion of a first portion of light (13, 90, 90′) from a source of light (11) is masked by a mask (138), and the resulting masked first portion of light (90″) is combined using a beam splitter optic (136) with at least one second portion of the light (30) that had been subject to scattering by a medium (20, 20′, 20″). The mask (138) is configured so that interference patterns (104, 47) generated from the first and at least one second portions of light are substantially mutually exclusive even though those interference patterns (104, 47) would otherwise overlap one another absent the mask (138).
Public/Granted literature
- US20120274937A1 LIGHT PROCESSING SYSTEM AND METHOD Public/Granted day:2012-11-01
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