Invention Grant
- Patent Title: Heat resistant piezo bimorph synthetic jet apparatus
- Patent Title (中): 耐热压电双相合成喷射装置
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Application No.: US12960952Application Date: 2010-12-06
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Publication No.: US08820658B2Publication Date: 2014-09-02
- Inventor: Seyed G Saddoughi , Grover Bennett, Jr.
- Applicant: Seyed G Saddoughi , Grover Bennett, Jr.
- Applicant Address: US MD Bethesda
- Assignee: Lockheed Martin Corporation
- Current Assignee: Lockheed Martin Corporation
- Current Assignee Address: US MD Bethesda
- Agency: Reising Ethington P.C.
- Agent John J. Snyder
- Main IPC: B05B1/08
- IPC: B05B1/08 ; H01L41/09

Abstract:
A heat resistant piezo bimorph synthetic jet apparatus comprises a working fluid chamber partially defined by a plate, a working fluid port that provides fluid flow communication between the working fluid chamber and a working fluid mass, and a bimorph piezoelectric structure included in the plate. The bimorph piezoelectric structure alternately increases and decreases chamber volume by alternately expanding convexly and concavely in response to application of voltage of alternating polarity to alternately draw working fluid into and expel working fluid from the working fluid chamber through the working fluid port. A thermal insulating layer is disposed between the working fluid chamber and the bimorph piezoelectric structure to protect a ceramic layer within the first bimorph piezoelectric structure from high temperature working fluid.
Public/Granted literature
- US20120138704A1 Heat Resistant Piezo Bimorph Synthetic Jet Apparatus Public/Granted day:2012-06-07
Information query
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