Invention Grant
US08822913B2 Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
有权
用于与可选离子聚焦的离子束柱的电感耦合等离子体离子源
- Patent Title: Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
- Patent Title (中): 用于与可选离子聚焦的离子束柱的电感耦合等离子体离子源
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Application No.: US13312704Application Date: 2011-12-06
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Publication No.: US08822913B2Publication Date: 2014-09-02
- Inventor: Anthony Graupera , Charles Otis
- Applicant: Anthony Graupera , Charles Otis
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg
- Main IPC: H01J27/16
- IPC: H01J27/16 ; H01J27/02 ; H01J49/26 ; B01D59/44
Abstract:
An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.
Public/Granted literature
- US20130140450A1 Inductively-Coupled Plasma Ion Source for Use with a Focused Ion Beam Column with Selectable Ions Public/Granted day:2013-06-06
Information query
