Invention Grant
- Patent Title: Irradiation device and irradiation method
- Patent Title (中): 照射装置和照射方法
-
Application No.: US13673412Application Date: 2012-11-09
-
Publication No.: US08823249B2Publication Date: 2014-09-02
- Inventor: Shinichi Nakamura , Seiji Kinoshita
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2011-249409 20111115; JP2011-249410 20111115
- Main IPC: H01J1/02
- IPC: H01J1/02 ; H01J7/24 ; H01J61/52 ; H01K1/58 ; H01J17/28 ; B41J11/00 ; H01J61/28

Abstract:
An irradiation device includes: a light source having an amalgam alloy member that is disposed on a part of the inner surface of a light source tube; and a chamber in which the light source is disposed. The chamber includes: a main chamber body; and a first gas inflow port and a first gas outflow port that are formed in the main chamber body. The first gas inflow port and the first gas outflow port are arranged so that the outer surface of the part of the light source tube where the amalgam alloy member is disposed is positioned in a flow path of a gas that flows in through the first gas inflow port and flows out through the first gas outflow port.
Public/Granted literature
- US20130119851A1 IRRADIATION DEVICE AND IRRADIATION METHOD Public/Granted day:2013-05-16
Information query