Invention Grant
- Patent Title: Defect inspecting apparatus and defect inspecting method
- Patent Title (中): 缺陷检查装置和缺陷检查方法
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Application No.: US13700150Application Date: 2011-06-17
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Publication No.: US08830465B2Publication Date: 2014-09-09
- Inventor: Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Shunichi Matsumoto
- Applicant: Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Shunichi Matsumoto
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2010-191633 20100830
- International Application: PCT/JP2011/003457 WO 20110617
- International Announcement: WO2012/029222 WO 20120308
- Main IPC: G01J4/00
- IPC: G01J4/00 ; G01N21/956 ; G01N21/95 ; G01N21/94

Abstract:
A defect inspecting apparatus includes an irradiation optical system having a light source that emits illumination light and a polarization generation part that adjusts polarization state of the illumination light emitted from the light source, a detection optical system having a polarization analysis part that adjusts polarization state of scattered light from a sample irradiated by the irradiation optical system and a detection part that detects the scattered light adjusted by the polarization analysis part, and a signal processing system that processes the scattered light detected by the detection optical system to detect a defect presenting in the sample. The polarization generation part adjusts the polarization state of the illumination light emitted from the light source on the basis of predetermined illumination conditions and the polarization analysis part adjusts the polarization state of the illumination light emitted from the light source on the basis of predetermined detection conditions.
Public/Granted literature
- US20130188184A1 DEFECT INSPECTING APPARATUS AND DEFECT INSPECTING METHOD Public/Granted day:2013-07-25
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