Invention Grant
- Patent Title: Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus
- Patent Title (中): 评估基板，检查装置和光刻装置的模型的方法
-
Application No.: US12920984Application Date: 2009-03-30
-
Publication No.: US08830472B2Publication Date: 2014-09-09
- Inventor: Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Henricus Petrus Maria Pellemans , Martin Ebert
- Applicant: Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Henricus Petrus Maria Pellemans , Martin Ebert
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2009/002300 WO 20090330
- International Announcement: WO2009/124669 WO 20091015
- Main IPC: G01N21/55
- IPC: G01N21/55 ; G01N21/956 ; G01N21/95 ; G03F7/20 ; G01N21/47 ; G01N21/88
Abstract:
A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate.
Public/Granted literature
- US20110026032A1 Method of Assessing a Model of a Substrate, an Inspection Apparatus and a Lithographic Apparatus Public/Granted day:2011-02-03
Information query
