Invention Grant
US08830590B2 Unit magnification large-format catadioptric lens for microlithography
有权
单位放大大幅度反射折射透镜用于微光刻
- Patent Title: Unit magnification large-format catadioptric lens for microlithography
- Patent Title (中): 单位放大大幅度反射折射透镜用于微光刻
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Application No.: US13897514Application Date: 2013-05-20
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Publication No.: US08830590B2Publication Date: 2014-09-09
- Inventor: David G. Stites
- Applicant: Ultratech, Inc.
- Applicant Address: US CA San Jose
- Assignee: Ultratech, Inc.
- Current Assignee: Ultratech, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Opticus IP Law PLLC
- Main IPC: G02B3/00
- IPC: G02B3/00 ; G02B9/00 ; G02B27/02 ; G03B27/42 ; G03B21/14

Abstract:
A unit magnification Wynn-Dyson lens for microlithography has an image field sized to accommodate between four and six die of dimensions 26 mm×36 mm. The lens has a positive lens group that consists of either three or four refractive lens elements, with one of the lens elements being most mirror-wise and having a prism-wise concave aspheric surface. Protective windows respectively reside between object and image planes and the corresponding prism faces. The lens is corrected for at least the i-line LED wavelength spectrum or similar LED-generated wavelengths.
Public/Granted literature
- US20130321935A1 Unit magnification large-format catadioptric lens for microlithography Public/Granted day:2013-12-05
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