Invention Grant
- Patent Title: Charged particle beam microscope
- Patent Title (中): 带电粒子束显微镜
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Application No.: US13812899Application Date: 2011-08-08
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Publication No.: US08841612B2Publication Date: 2014-09-23
- Inventor: Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
- Applicant: Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2010-214595 20100925
- International Application: PCT/JP2011/068091 WO 20110808
- International Announcement: WO2012/039206 WO 20120329
- Main IPC: G01N23/00
- IPC: G01N23/00 ; H01J23/00 ; H01J37/26 ; H01J37/22 ; H01J37/28 ; G01K7/00 ; G01N23/22
Abstract:
This charged particle beam microscope is characterized by being provided with selection means (153, 155) for a measurement processing method for detected particles (118) and by this means selecting a different measurement processing method for a scanning region with a large number of secondary electrons (115) emitted from a sample (114) and for a region with a small number of secondary electrons. Thus, in sample scanning using a charged particle beam microscope, an image in which the contrast of bottom holes and channel bottoms with few emitted secondary electrons is emphasized and images that emphasize shadow contrast can be acquired in a short period of time.
Public/Granted literature
- US20130126733A1 Charged Particle Beam Microscope Public/Granted day:2013-05-23
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