Invention Grant
- Patent Title: Liquid processing method
- Patent Title (中): 液体加工方法
-
Application No.: US13656861Application Date: 2012-10-22
-
Publication No.: US08846145B2Publication Date: 2014-09-30
- Inventor: Michio Kinoshita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2008-270431 20081021
- Main IPC: B05D3/12
- IPC: B05D3/12 ; G03F7/16 ; B05B15/02 ; B05B12/08 ; G03F7/30 ; H01L21/67 ; B05B1/14

Abstract:
A liquid processing method forms a coating film by supplying and pouring a coating solution from a coating solution nozzle onto a surface of a substrate held substantially horizontally by a substrate holder. In the liquid processing method, a process for photographing a leading end portion of a coating solution nozzle is provided. When performing a process for anti-drying of the coating solution for a long period of time in advance, a position of the coating solution and a position of an anti-drying liquid are set by using a soft scale displayed on a screen where the photographed image is displayed. Therefore, a dispense control is performed based on a set value without depending on the naked eyes and a control for suppressing the drying of the coating solution in the leading end portion of the coating solution nozzle is performed.
Public/Granted literature
- US20130040062A1 LIQUID PROCESSING METHOD Public/Granted day:2013-02-14
Information query