Invention Grant
- Patent Title: Interconnect structure
- Patent Title (中): 互连结构
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Application No.: US12965192Application Date: 2010-12-10
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Publication No.: US08853558B2Publication Date: 2014-10-07
- Inventor: Debabrata Gupta , Yukio Hashimoto , Ilyas Mohammed , Laura Mirkarimi , Rajesh Katkar
- Applicant: Debabrata Gupta , Yukio Hashimoto , Ilyas Mohammed , Laura Mirkarimi , Rajesh Katkar
- Applicant Address: US CA San Jose
- Assignee: Tessera, Inc.
- Current Assignee: Tessera, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Main IPC: H05K1/16
- IPC: H05K1/16 ; H01L25/10 ; H01L23/498 ; H01L23/00

Abstract:
A microelectronic assembly includes a first surface and a first thin conductive element exposed at the first surface and having a face comprising first and second regions. A first conductive projection having a base connected to and covering the first region of the face extends to an end remote from the base. A first dielectric material layer covers the second region of the first thin element and contacts at least the base of the first conductive projection. The assembly further includes a second substrate having a second face and a second conductive projection extending away from the second face. A first fusible metal mass connects the first projection to the second projection and extends along an edge of the first projection towards the first dielectric material layer.
Public/Granted literature
- US20120145442A1 INTERCONNECT STRUCTURE Public/Granted day:2012-06-14
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