Invention Grant
- Patent Title: Excimer laser apparatus and excimer laser system
- Patent Title (中): 准分子激光装置和准分子激光系统
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Application No.: US13656917Application Date: 2012-10-22
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Publication No.: US08867583B2Publication Date: 2014-10-21
- Inventor: Tooru Abe , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Hogan Lovells US LLP
- Priority: JP2011-234057 20111025; JP2012-160399 20120719
- Main IPC: H01S3/22
- IPC: H01S3/22 ; H01S3/036 ; H01S3/08 ; H01S3/23 ; H01S3/225 ; H01S3/134

Abstract:
An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Public/Granted literature
- US20130100980A1 EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM Public/Granted day:2013-04-25
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