Invention Grant
- Patent Title: Wiring substrate and manufacturing method for wiring substrate
- Patent Title (中): 布线基板的布线基板和制造方法
-
Application No.: US13629660Application Date: 2012-09-28
-
Publication No.: US08878076B2Publication Date: 2014-11-04
- Inventor: Hideaki Yoshimura
- Applicant: Fujitsu Limited
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Squire Patton Boggs (US) LLP
- Priority: JP2011-231684 20111021
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H05K3/42 ; H05K3/44 ; H05K1/02

Abstract:
A wiring substrate includes: a plate-like base material containing carbon fibers; a wiring layer formed on a surface of the base material; a first via including a first through hole penetrating through the base material, a first resin layer formed on an inner wall of the first through hole and including a second through hole, and a first conductive layer formed on an inner wall of the second through hole; and a second via including a third through hole penetrating through the base material and a second conductive layer formed on an inner wall of the third through hole, wherein an inside diameter of the third through hole is greater than an inside diameter of the second through hole.
Public/Granted literature
- US20130098669A1 WIRING SUBSTRATE AND MANUFACTURING METHOD FOR WIRING SUBSTRATE Public/Granted day:2013-04-25
Information query