An analysis apparatus includes a plasma generation unit and an optical analysis unit. The plasma generation unit generates initial plasma by momentarily energizing a target substance to be turned into a plasma state, and maintains the target substance in the plasma state by irradiating the initial plasma with an electromagnetic wave for a predetermined period of time. The optical analysis unit identifies the target substance based on information with respect to emission intensity during a period from when the emission intensity reaches a peak due to the initial plasma until when the emission intensity increases and reaches approximately a constant value due to electromagnetic wave plasma maintained by the electromagnetic wave, or information with respect to emission intensity after the electromagnetic wave irradiation is terminated.