Invention Grant
- Patent Title: Unevenness inspection apparatus and unevenness inspection method
- Patent Title (中): 不均匀检查装置和不均匀性检查方法
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Application No.: US13523546Application Date: 2012-06-14
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Publication No.: US08885052B2Publication Date: 2014-11-11
- Inventor: Kunihiko Nagamine , Satoshi Tomioka
- Applicant: Kunihiko Nagamine , Satoshi Tomioka
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sony Corporation of America
- Priority: JP2011-136930 20110621; JP2012-101419 20120426
- Main IPC: H04N17/00
- IPC: H04N17/00 ; H04N17/02 ; G01J3/50 ; G01J3/46

Abstract:
An unevenness inspection apparatus including: an image pickup section obtaining a pickup image of a test object; an image generating section generating each of a color unevenness inspection image and a luminance unevenness inspection image based on the pickup image; a calculating section calculating an evaluation parameter using both of the color unevenness inspection image and the luminance unevenness inspection image; and an inspecting section performing unevenness inspection using the calculated evaluation parameter. The calculating section calculates the evaluation parameter in consideration of unevenness visibility for both color and luminance.
Public/Granted literature
- US20120327399A1 UNEVENNESS INSPECTION APPARATUS AND UNEVENNESS INSPECTION METHOD Public/Granted day:2012-12-27
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