Invention Grant
- Patent Title: Filament for electron source
- Patent Title (中): 电子源灯丝
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Application No.: US12909745Application Date: 2010-10-21
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Publication No.: US08896195B2Publication Date: 2014-11-25
- Inventor: Juying Dou
- Applicant: Juying Dou
- Applicant Address: TW Hsin-Chu
- Assignee: Hermes Microvision, Inc.
- Current Assignee: Hermes Microvision, Inc.
- Current Assignee Address: TW Hsin-Chu
- Agency: WPAT, PC
- Agent Justin King
- Main IPC: H01J1/15
- IPC: H01J1/15 ; H01J19/08 ; H01K1/02 ; H01J37/065

Abstract:
This invention relates to a filament for electron emission cathode which is employed in an electron microscope, a critical dimension examine tool, an electron beam lithograph machine, an electron beam tester and other electron beam related systems as an electron source. Embodiments of the present invention discloses method with which a Re (Rhenium) is used as heat source such that vibration issue of prior tungsten filament can be depressed.
Public/Granted literature
- US20120098409A1 Filament for Electron Source Public/Granted day:2012-04-26
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