Invention Grant
- Patent Title: Vacuum chamber for ion manipulation device
- Patent Title (中): 离子操作装置真空室
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Application No.: US14292437Application Date: 2014-05-30
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Publication No.: US08907273B1Publication Date: 2014-12-09
- Inventor: Tsung-Chi Chen , Keqi Tang , Yehia M. Ibrahim , Richard D. Smith , Gordon A. Anderson , Erin M. Baker
- Applicant: Tsung-Chi Chen , Keqi Tang , Yehia M. Ibrahim , Richard D. Smith , Gordon A. Anderson , Erin M. Baker
- Applicant Address: unknown Richland, Washgington
- Assignee: Battelle Memorial Institute
- Current Assignee: Battelle Memorial Institute
- Current Assignee Address: unknown Richland, Washgington
- Agent A. J. Gokcek
- Main IPC: H01J49/06
- IPC: H01J49/06

Abstract:
An ion manipulation method and device is disclosed. The device includes a pair of substantially parallel surfaces. An array of inner electrodes is contained within, and extends substantially along the length of, each parallel surface. The device includes a first outer array of electrodes and a second outer array of electrodes. Each outer array of electrodes is positioned on either side of the inner electrodes, and is contained within and extends substantially along the length of each parallel surface. A DC voltage is applied to the first and second outer array of electrodes. A RF voltage, with a superimposed electric field, is applied to the inner electrodes by applying the DC voltages to each electrode. Ions either move between the parallel surfaces within an ion confinement area or along paths in the direction of the electric field, or can be trapped in the ion confinement area. A predetermined number of pairs of surfaces are disposed in one or more chambers, forming a multiple-layer ion mobility cyclotron device.
Public/Granted literature
- US2201722A Vending machine Public/Granted day:1940-05-21
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