Invention Grant
- Patent Title: Use of diazonium salts for the formation of thick layers on at least one surface of a substrate
- Patent Title (中): 使用重氮盐在基材的至少一个表面上形成厚层
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Application No.: US13820325Application Date: 2011-08-31
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Publication No.: US08926821B2Publication Date: 2015-01-06
- Inventor: Fabien Lefloch , Muriel Matheron
- Applicant: Fabien Lefloch , Muriel Matheron
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique et aux Energies Alternatives
- Current Assignee: Commissariat a l'Energie Atomique et aux Energies Alternatives
- Current Assignee Address: FR Paris
- Agency: Lowe Hauptman & Ham, LLP
- Priority: FR1003498 20100901
- International Application: PCT/IB2011/053815 WO 20110831
- International Announcement: WO2012/029035 WO 20120308
- Main IPC: C25D9/02
- IPC: C25D9/02 ; G01N27/28 ; C07C255/34 ; C09D5/44 ; G01N33/00 ; B05D1/00

Abstract:
The invention relates to the use of diazonium salts for the formation of thick layers on at least one surface of a substrate. The diazonium salts used in the invention have the following formula (I): wherein R is a group that can be electrochemically reduced in a reversible manner to a cathodic potential between 0 and −1.5 V, E is a spacer chain consisting of at least one aromatic cyclic group having between 5 and 6 links, optionally containing at least one heteroatom preferably selected from N, S, O or P and optionally substituted by at least one group selected from the C1-C5 alkyls and the halogens, r is 1 or 2, m is a whole number between 1 and 5 inclusive, p is a whole number between 1 and 5, and B is a counter-ion. The invention can be especially applied to the field of gas sensors.
Public/Granted literature
- US20130239661A1 USE OF DIAZONIUM SALTS FOR THE FORMATION OF THICK LAYERS ON AT LEAST ONE SURFACE OF A SUBSTRATE Public/Granted day:2013-09-19
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