Invention Grant
US08926853B2 Graphene structures with enhanced stability and composite materials formed therefrom
有权
具有增强的稳定性的石墨烯结构和由其形成的复合材料
- Patent Title: Graphene structures with enhanced stability and composite materials formed therefrom
- Patent Title (中): 具有增强的稳定性的石墨烯结构和由其形成的复合材料
-
Application No.: US13592370Application Date: 2012-08-23
-
Publication No.: US08926853B2Publication Date: 2015-01-06
- Inventor: Xin Zhao , Yu-Ming Lin
- Applicant: Xin Zhao , Yu-Ming Lin
- Main IPC: B44C1/22
- IPC: B44C1/22 ; B05D3/10

Abstract:
Aspects of the invention are directed to a method of forming graphene structures. Initially, a cluster of particles is received. The cluster of particles comprises a plurality of particles with each particle in the plurality of particles contacting one or more other particles in the plurality of particles. Subsequently, one or more layers are deposited on the cluster of particles with the one or more layers comprising graphene. The plurality of particles are then etched away without substantially etching the deposited one or more layers. Lastly, the remaining one or more layers are dried. The resultant graphene structures are particularly resistant to the negative effects of aggregation and compaction.
Public/Granted literature
- US20140057113A1 Graphene Structures with Enhanced Stability and Composite Materials Formed Therefrom Public/Granted day:2014-02-27
Information query