Invention Grant
US08927941B2 Multi charged particle beam writing apparatus and multi charged particle beam writing method with fixed voltage ratio einzel lens
有权
多电荷粒子束写入装置和多电荷粒子束写入方法,具有固定电压比率的einzel透镜
- Patent Title: Multi charged particle beam writing apparatus and multi charged particle beam writing method with fixed voltage ratio einzel lens
- Patent Title (中): 多电荷粒子束写入装置和多电荷粒子束写入方法,具有固定电压比率的einzel透镜
-
Application No.: US13763976Application Date: 2013-02-11
-
Publication No.: US08927941B2Publication Date: 2015-01-06
- Inventor: Takanao Touya , Shuichi Tamamushi , Munehiro Ogasawara
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-062437 20120319
- Main IPC: H01J37/22
- IPC: H01J37/22 ; H01J37/317 ; H01J37/30 ; H01J37/145 ; H01J37/153

Abstract:
A multi charged particle beam writing apparatus according to the present invention includes an aperture member, in which a plurality of openings are formed, to form multiple beams, a blanking plate having a plurality of blankers to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member, a blanking aperture member to block each of beams which were deflected to be in a beam off state by the plurality of blankers, a plural stage objective lens to focus multiple beams having passed through the blanking aperture member onto the target object and a plurality of electrostatic lenses, at least one of which is arranged at each stage of the plural stage objective lens, to dynamically correct defocusing of the multiple beams during writing.
Public/Granted literature
- US20130240750A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2013-09-19
Information query