Invention Grant
- Patent Title: Electronic device manufacture using low-k dielectric materials
- Patent Title (中): 使用低k电介质材料的电子器件制造
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Application No.: US13358462Application Date: 2012-01-25
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Publication No.: US08945677B2Publication Date: 2015-02-03
- Inventor: Nicholas A. Zafiropoulos , Paul Nahass , Roxana Trifu , Redouane Begag , Wendell E. Rhine , Wenting Dong , Shannon White , George L. Gould , Alaric Naiman , Roger Sinta
- Applicant: Nicholas A. Zafiropoulos , Paul Nahass , Roxana Trifu , Redouane Begag , Wendell E. Rhine , Wenting Dong , Shannon White , George L. Gould , Alaric Naiman , Roger Sinta
- Applicant Address: US MA Northborough
- Assignee: Aspen Aerogels, Inc.
- Current Assignee: Aspen Aerogels, Inc.
- Current Assignee Address: US MA Northborough
- Agent Mark Hanson; Poongunran Muthukumaran
- Main IPC: B05D3/10
- IPC: B05D3/10 ; H01L21/02 ; H01L21/3105 ; C08L79/08
Abstract:
Materials and methods for manufacturing electronic devices and semiconductor components using low dielectric materials comprising polyimide based aerogels are described. Additional methods for manipulating the properties of the dielectric materials and affecting the overall dielectric property of the system are also provided.
Public/Granted literature
- US20120189782A1 ELECTRONIC DEVICE MANUFACTURE USING LOW-k DIELECTRIC MATERIALS Public/Granted day:2012-07-26
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