Invention Grant
- Patent Title: Electron beam interference device and electron beam interferometry
- Patent Title (中): 电子束干涉装置和电子束干涉测量
-
Application No.: US13810934Application Date: 2012-02-03
-
Publication No.: US08946628B2Publication Date: 2015-02-03
- Inventor: Ken Harada , Hiroto Kasai
- Applicant: Ken Harada , Hiroto Kasai
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- International Application: PCT/JP2012/000724 WO 20120203
- International Announcement: WO2013/114464 WO 20130808
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00 ; H01J37/252 ; G01N23/04 ; H01J37/26 ; H01J37/147

Abstract:
There is a limit in range and distance in which an electron beam can interfere and electron interference is implemented within a range of a coherence length. Therefore, interference images are consecutively recorded for each interference region width from an interference image of a reference wave and an observation region adjacent to the reference wave by considering that a phase distribution regenerated and observed by an interference microscopy is a differential between phase distributions of two waves used for interference and a differential image between phase distributions of a predetermined observation region and a predetermined reference wave is acquired by acquiring integrating phase distributions acquired by individually regenerating the interference images. This work enables a wide range of interference image which is more than a coherence length by arranging phase distribution images performed and acquired in the respective phase distributions in a predetermined order.
Public/Granted literature
- US20140332684A1 Electron Beam Interference Device and Electron Beam Interferometry Public/Granted day:2014-11-13
Information query