Invention Grant
- Patent Title: Catadioptric objective for scatterometry
- Patent Title (中): 反射折射目标用于散射测量
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Application No.: US13687630Application Date: 2012-11-28
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Publication No.: US08982481B2Publication Date: 2015-03-17
- Inventor: Stanislav Y. Smirnov , Adel Joobeur , Yevgeniy Konstantinovich Shmarev , Arun Mahadevan Venkataraman
- Applicant: ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G02B17/00
- IPC: G02B17/00 ; G02B17/08 ; G03F7/20

Abstract:
A system and method is described for correcting aberrations caused by field curvature with a catadioptric objective. In one example, a catadioptric optical system includes a first catadioptric element and a second catadioptric element. The first catadioptric element includes a first surface positioned to reflect a beam and a second surface positioned to focus the beam reflected by the first surface. The second catadioptric element is configured to receive the beam reflected by the second surface of the first catadioptric element. The second catadioptric element includes a third surface positioned to reflect the beam, and a fourth reflective surface positioned to focus the beam reflected by the third reflective surface. A curvature of the third or fourth surfaces of the second catadioptric element is chosen to apply a positive contribution to a field curvature associated with the first catadioptric element.
Public/Granted literature
- US20130170049A1 Catadioptric Objective for Scatterometry Public/Granted day:2013-07-04
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |