Invention Grant
- Patent Title: Multilayer film and method for producing the same
- Patent Title (中): 多层膜及其制造方法
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Application No.: US13202064Application Date: 2010-02-16
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Publication No.: US08986828B2Publication Date: 2015-03-24
- Inventor: Naoya Imamura , Yasuo Enatsu , Mitsunori Hachisuka
- Applicant: Naoya Imamura , Yasuo Enatsu , Mitsunori Hachisuka
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-035064 20090218
- International Application: PCT/JP2010/052584 WO 20100216
- International Announcement: WO2010/095729 WO 20100826
- Main IPC: B05D3/02
- IPC: B05D3/02 ; C08J7/04 ; C09D183/02

Abstract:
A multilayer film (10) is provided with a hard coat layer (12) and a film base (11) formed from a polymer compound. A heat shrinkage factor of the film base (11) (170° C., 10 minutes) is in a range from 0.05% to 3.0%. The hard coat layer (12) is formed by applying a coating liquid (33) containing a compound represented by a general formula (1), tetraalkoxysilane, acid water with pH in a range from 2 to 6, and a water-soluble hardening agent. An amount of the acid water is in a range from 60 to 2000 pts. wt. relative to a total amount 100 pts. wt. of the compound represented by the general formula (1) and tetraalkoxysilane. In the general formula (1), “R1” is an organic group having 1 to 15 carbons and containing no amino group. “R2” is a methyl group or ethyl group, “R3” is an alkyl group having 1 to 3 carbons, and “n” is zero or 1. (1) R1R2nSi(OR3)3-n.
Public/Granted literature
- US20120034449A1 MULTILAYER FILM AND METHOD FOR PRODUCING THE SAME Public/Granted day:2012-02-09
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