Invention Grant
- Patent Title: Copper pillar full metal via electrical circuit structure
- Patent Title (中): 铜柱全金属通过电路结构
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Application No.: US13413724Application Date: 2012-03-07
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Publication No.: US08987886B2Publication Date: 2015-03-24
- Inventor: James Rathburn
- Applicant: James Rathburn
- Applicant Address: US MN Maple Grove
- Assignee: HSIO Technologies, LLC
- Current Assignee: HSIO Technologies, LLC
- Current Assignee Address: US MN Maple Grove
- Agency: Stoel Rives LLP
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01L23/498 ; H01L21/48 ; H01L21/768

Abstract:
An electrical interconnect including a first circuitry layer with a first surface and a second surface. At least a first dielectric layer is printed on the first surface of the first circuitry layer to include a plurality of first recesses. A conductive material is deposited in a plurality of the first recesses to form a plurality of first conductive pillars electrically coupled to, and extending generally perpendicular to, the first circuitry layer. At least a second dielectric layer is printed on the first dielectric layer to include a plurality of second recesses generally aligned with a plurality of the first conductive pillars. A conductive material is deposited in a plurality of the second recesses to form a plurality of second conductive pillars electrically coupled to, and extending parallel the first conductive pillars.
Public/Granted literature
- US20120168948A1 COPPER PILLAR FULL METAL VIA ELECTRICAL CIRCUIT STRUCTURE Public/Granted day:2012-07-05
Information query
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