Invention Grant
- Patent Title: Process chamber component having yttrium—aluminum coating
- Patent Title (中): 具有钇铝涂层的工艺室部件
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Application No.: US13368255Application Date: 2012-02-07
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Publication No.: US09012030B2Publication Date: 2015-04-21
- Inventor: Nianci Han , Li Xu , Hong Shih
- Applicant: Nianci Han , Li Xu , Hong Shih
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Janah & Associates, P.C.
- Agent Ashok K. Janah
- Main IPC: C23C4/10
- IPC: C23C4/10 ; B05C11/00 ; B32B15/04 ; B32B15/20 ; C25D3/54 ; C23C16/44 ; C23C30/00 ; C25D5/50 ; H01J37/32 ; H01L21/67 ; C23C28/00 ; C25D3/44 ; C25D3/56 ; C25D5/18
Abstract:
A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.
Public/Granted literature
- US20120135155A1 PROCESS CHAMBER COMPONENT HAVING YTTRIUM-ALUMINUM COATING Public/Granted day:2012-05-31
Information query
IPC分类:
