Invention Grant
- Patent Title: Stage apparatus and process apparatus
- Patent Title (中): 舞台装置和处理装置
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Application No.: US13428530Application Date: 2012-03-23
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Publication No.: US09021983B2Publication Date: 2015-05-05
- Inventor: Ryoichi Inanami , Shinichi Ito , Hiroshi Koizumi , Akihiro Kojima
- Applicant: Ryoichi Inanami , Shinichi Ito , Hiroshi Koizumi , Akihiro Kojima
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2011-156005 20110714
- Main IPC: B05C11/00
- IPC: B05C11/00 ; C23C16/00 ; H01L21/76 ; H01L21/687 ; H01L21/67 ; H01L21/683

Abstract:
According to one embodiment, a stage apparatus includes a height control unit includes height control elements each which is drove in an upward/downward direction independently, a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas. The control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in a allowable range, and set the height of the area out of the allowable range again by the height control elements.
Public/Granted literature
- US20130014360A1 STAGE APPARATUS AND PROCESS APPARATUS Public/Granted day:2013-01-17
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