Invention Grant
- Patent Title: Method for synthesizing carbon nanowires on surface of pores or gaps in structure
- Patent Title (中): 在结构孔隙或间隙表面合成碳纳米线的方法
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Application No.: US14034656Application Date: 2013-09-24
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Publication No.: US09028916B2Publication Date: 2015-05-12
- Inventor: Nam Jo Jeong , Se Young Kim , In Sub Han , Sang Kuk Woo , Doo Won Seo
- Applicant: Nam Jo Jeong , Se Young Kim , In Sub Han , Sang Kuk Woo , Doo Won Seo
- Applicant Address: KR Jang-dong, Yuseong-gu, Dajeon
- Assignee: Korea Institute of Energy Research
- Current Assignee: Korea Institute of Energy Research
- Current Assignee Address: KR Jang-dong, Yuseong-gu, Dajeon
- Agency: IP Attorneys Group, LLC
- Priority: KR10-2012-0111932 20121009
- Main IPC: C23C16/26
- IPC: C23C16/26 ; C23C16/40 ; C01B31/02 ; B01J23/14 ; B01J23/72 ; B01J23/755 ; B01J23/835 ; B01J35/00 ; B01J37/02 ; D01D5/00 ; D01F9/127 ; D01F9/133 ; B82Y30/00 ; B82Y40/00 ; B01J21/06 ; B01J21/18 ; B01J23/06 ; B01J23/08 ; B01J23/18 ; B01J23/74 ; B01J35/10
Abstract:
A method for synthesizing carbon nanowires directly on the internal surface of a three-dimensional structure including a carbon structure and, more particularly, to a method for synthesizing carbon nanowires on the surface of pores or gaps present in a structure. According to the present invention, it is possible to fill fine pores or gaps in a structure, which cause a reduction in mechanical properties or conductivity, with high-density carbon nanowires, thus significantly improving mechanical or electrical performance of a final product.
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