Invention Grant
- Patent Title: Reticle chuck cleaner
- Patent Title (中): 标线卡盘清洁剂
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Application No.: US13192694Application Date: 2011-07-28
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Publication No.: US09034467B2Publication Date: 2015-05-19
- Inventor: Masamitsu Itoh , Katsuya Okumura , Taro Inada , Jun Watanabe
- Applicant: Masamitsu Itoh , Katsuya Okumura , Taro Inada , Jun Watanabe
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2010-169691 20100728
- Main IPC: B32B7/12
- IPC: B32B7/12 ; B08B7/00 ; G03F7/20
Abstract:
According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
Public/Granted literature
- US20120024318A1 RETICLE CHUCK CLEANER Public/Granted day:2012-02-02
Information query
