-
公开(公告)号：US09808841B2
公开(公告)日：2017-11-07
申请号：US14342718
申请日：2012-06-22
Applicant: Yoshihito Kobayashi , Masamitsu Itoh , Taro Inada , Jun Watanabe
Inventor： Yoshihito Kobayashi , Masamitsu Itoh , Taro Inada , Jun Watanabe
CPC classification number: B08B7/0028 , B08B7/0014 , G03F7/707 , G03F7/70925
Abstract: There is provided a reticle chuck cleaner A for cleaning a reticle chuck of an apparatus, as a reticle chuck cleaner that allows easy cleaning of a reticle chuck in a vacuum chamber of an apparatus without exposing the chamber to the atmosphere and contributes to improvement of the operating ratio of the apparatus, including: an adhesive layer 1 to be adhered to a chuck region of the reticle chuck; a support layer 2 laminated on the adhesive layer 1; and a substrate 3 having a shape capable of being carried to the reticle chuck, the support layer 2 and the substrate 3 being partially bonded together in an adhesive region 41 of a partial adhesive layer 4.
-
公开(公告)号：US09034467B2
公开(公告)日：2015-05-19
申请号：US13192694
申请日：2011-07-28
Applicant: Masamitsu Itoh , Katsuya Okumura , Taro Inada , Jun Watanabe
Inventor： Masamitsu Itoh , Katsuya Okumura , Taro Inada , Jun Watanabe
CPC classification number: B08B7/0028 , B05D3/0254 , B05D5/00 , G03F7/707 , G03F7/70925 , Y10T428/28 , Y10T428/2848
Abstract: According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
Abstract translation: 根据一个实施例，用于清洁EUV曝光装置的光罩卡盘的掩模版卡盘清洁器包括具有要携带到EUV曝光装置的掩模版卡盘的形状的基板，以及形成在其中一个主表面上的粘合剂 基质。
-
3.发明申请RETICLE CHUCK CLEANER AND RETICLE CHUCK CLEANING METHOD 有权RETICLE CHUCK CLEANER和RETICLE CHUCK CLEANING METHOD公开(公告)号：US20140326278A1
公开(公告)日：2014-11-06
申请号：US14342718
申请日：2012-06-22
Applicant: Yoshihito Kobayashi , Masamitsu Itoh , Taro Inada , Jun Watanabe
Inventor： Yoshihito Kobayashi , Masamitsu Itoh , Taro Inada , Jun Watanabe
IPC: B08B7/00
CPC classification number: B08B7/0028 , B08B7/0014 , G03F7/707 , G03F7/70925
Abstract: There is provided a reticle chuck cleaner A for cleaning a reticle chuck of an apparatus, as a reticle chuck cleaner that allows easy cleaning of a reticle chuck in a vacuum chamber of an apparatus without exposing the chamber to the atmosphere and contributes to improvement of the operating ratio of the apparatus, including: an adhesive layer 1 to be adhered to a chuck region of the reticle chuck;a support layer 2 laminated on the adhesive layer 1; and a substrate 3 having a shape capable of being carried to the reticle chuck, the support layer 2 and the substrate 3 being partially bonded together in an adhesive region 41 of a partial adhesive layer 4.
Abstract translation: 提供了一种用于清洁装置的光罩卡盘的光罩卡盘清洁器A，作为光罩卡盘清洁器，其能够容易地清洁设备的真空室中的光罩卡盘而不将该腔室暴露在大气中并有助于改进 该装置的工作比例包括：粘合剂层1，其粘附到标线盘卡盘的卡盘区域; 层叠在粘合剂层1上的支撑层2; 以及具有能够被携带到掩模版卡盘的形状的基板3，支撑层2和基板3部分地粘合在部分粘合层4的粘合区域41中。
-
公开(公告)号：US20120024318A1
公开(公告)日：2012-02-02
申请号：US13192694
申请日：2011-07-28
Applicant: Masamitsu ITOH , Katsuya Okumura , Taro Inada , Jun Watanabe
Inventor： Masamitsu ITOH , Katsuya Okumura , Taro Inada , Jun Watanabe
CPC classification number: B08B7/0028 , B05D3/0254 , B05D5/00 , G03F7/707 , G03F7/70925 , Y10T428/28 , Y10T428/2848
Abstract: According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.
Abstract translation: 根据一个实施例，用于清洁EUV曝光装置的光罩卡盘的掩模版卡盘清洁器包括具有要携带到EUV曝光装置的掩模版卡盘的形状的基板，以及形成在其中一个主表面上的粘合剂 基质。
-
-
-
Search Results
4
records
(took 0.013 seconds)
