Invention Grant
- Patent Title: Displacement device, lithographic apparatus and positioning method
- Patent Title (中): 位移装置,光刻设备和定位方法
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Application No.: US13105748Application Date: 2011-05-11
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Publication No.: US09052613B2Publication Date: 2015-06-09
- Inventor: Johannes Hubertus Antonius Van de Rijdt , Joost Jeroen Ottens , Marcus Martinus Petrus Adrianus Vermeulen , Erik Johannes Antonius Manders
- Applicant: Johannes Hubertus Antonius Van de Rijdt , Joost Jeroen Ottens , Marcus Martinus Petrus Adrianus Vermeulen , Erik Johannes Antonius Manders
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; H02K41/03

Abstract:
A displacement device with a first and second part which are displaceable relative to one another, the first part being provided with a system of magnets, the second part being provided with a set of coil block units including: at least three first coil block units having current conductors oriented parallel to a second direction, at least two second coil block units having current conductors oriented parallel to a first direction, wherein the displacement device includes a controller configured to control the position of the second part relative to the first part, and wherein when the second part mainly moves in the second direction the controller is configured to levitate the second part from the first part in the third direction by using first coil block units only.
Public/Granted literature
- US20110299054A1 DISPLACEMENT DEVICE, LITHOGRAPHIC APPARATUS AND POSITIONING METHOD Public/Granted day:2011-12-08
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