Invention Grant
- Patent Title: System for attachment of an electrode into a plasma source
- Patent Title (中): 用于将电极附接到等离子体源中的系统
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Application No.: US13307830Application Date: 2011-11-30
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Publication No.: US09053895B2Publication Date: 2015-06-09
- Inventor: Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
- Applicant: Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
- Applicant Address: US OR Hillsboro
- Assignee: FEI COMPANY
- Current Assignee: FEI COMPANY
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg
- Main IPC: H01J1/02
- IPC: H01J1/02 ; H01J37/08 ; H01J37/04 ; H01J27/16
Abstract:
An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
Public/Granted literature
- US08928210B2 System for attachment of an electrode into an inductively coupled plasma source Public/Granted day:2015-01-06
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