Invention Grant
- Patent Title: Method for charged-particle multi-beam exposure
- Patent Title (中): 带电粒子多光束曝光方法
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Application No.: US14341381Application Date: 2014-07-25
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Publication No.: US09053906B2Publication Date: 2015-06-09
- Inventor: Elmar Platzgummer
- Applicant: IMS Nanofabrication AG
- Applicant Address: AT Vienna
- Assignee: IMS Nanofabrication AG
- Current Assignee: IMS Nanofabrication AG
- Current Assignee Address: AT Vienna
- Agency: KPPB LLP
- Priority: EP13178066 20130725; EP13194388 20131126
- Main IPC: H01J37/302
- IPC: H01J37/302 ; H01J37/317

Abstract:
To irradiate a target with a beam of energetic radiation formed by electrically charged particles, the beam is formed and imaged onto a target, where it generates a pattern image composed of pixels. The pattern image is moved along a path on the target over a region to be exposed, and this movement defines a number of stripes covering said region in sequential exposures and having respective widths. The number of stripes is written in at least two subsequent passes such that for each pass, the widths of the stripes of one pass combine into a cover of the total width of the region to be exposed; and each pass is associated with one of a number of partial grids of pattern pixels which are exposable during the respective pass. The mutually different partial grids combine to the complete plurality of pattern pixels which compose the region to be exposed.
Public/Granted literature
- US20150028230A1 METHOD FOR CHARGED-PARTICLE MULTI-BEAM EXPOSURE Public/Granted day:2015-01-29
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