Invention Grant
US09055660B2 System and method for plasma generation 有权
用于等离子体产生的系统和方法

  • Patent Title: System and method for plasma generation
  • Patent Title (中): 用于等离子体产生的系统和方法
  • Application No.: US13596026
    Application Date: 2012-08-27
  • Publication No.: US09055660B2
    Publication Date: 2015-06-09
  • Inventor: Jack Hunt
  • Applicant: Jack Hunt
  • Main IPC: H05H1/46
  • IPC: H05H1/46 H05H1/10 B05D3/06
System and method for plasma generation
Abstract:
A system and method for generating a plasma. An embodiment of the system for generating a plasma may include a first electrode; a second electrode disposed adjacent the first electrode; a first power supply for supplying power at the second electrode; a second power supply for generating a magnetic field; and a sequencer for coordinating a discharge of power from the first power supply and a discharge of power from the second power supply. The first power supply may be configured such that the discharge of power from the first power supply generates a plasma between the first electrode and the second electrode. The second power supply may be configured such that the magnetic field generated by the discharge of power from the second power supply rotates the plasma.
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