Invention Grant
US09070633B2 Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactor
有权
感应耦合等离子体反应器中高效气体离解的方法和装置
- Patent Title: Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactor
- Patent Title (中): 感应耦合等离子体反应器中高效气体离解的方法和装置
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Application No.: US14284088Application Date: 2014-05-21
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Publication No.: US09070633B2Publication Date: 2015-06-30
- Inventor: Roy C. Nangoy , Saravjeet Singh , Jon C. Farr , Sharma V. Pamarthy , Ajay Kumar
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C03C15/00 ; C03C25/68 ; C23F1/00 ; H01L21/3065 ; H01J37/32 ; C23C16/455 ; C23C16/505 ; H01L21/67
Abstract:
Embodiments of the present disclosure relate to method and apparatus for providing processing gases to a process chamber with improved plasma dissociation efficiency. One embodiment of the present disclosure provides a baffle nozzle assembly comprising an outer body defining an extension volume connected to a processing chamber. A processing gas is flown to the processing chamber through the extension volume which is exposed to power source for plasma generation.
Public/Granted literature
- US20140256148A1 METHOD AND APPARATUS FOR HIGH EFFICIENCY GAS DISSOCIATION IN INDUCTIVE COUPLED PLASMA REACTOR Public/Granted day:2014-09-11
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