Invention Grant
US09091940B2 Lithographic apparatus and method involving a fluid inlet and a fluid outlet
有权
涉及流体入口和流体出口的平版印刷设备和方法
- Patent Title: Lithographic apparatus and method involving a fluid inlet and a fluid outlet
- Patent Title (中): 涉及流体入口和流体出口的平版印刷设备和方法
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Application No.: US13722830Application Date: 2012-12-20
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Publication No.: US09091940B2Publication Date: 2015-07-28
- Inventor: Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Joeri Lof , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Alexander Straaijer , Bob Streefkerk , Joannes Theodoor De Smit , Helmar Van Santen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP02257822 20021112; EP03252955 20030513
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20 ; G03F9/00
Abstract:
In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
Public/Granted literature
- US20130301017A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2013-11-14
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