Invention Grant
- Patent Title: Focusing a charged particle imaging system
- Patent Title (中): 聚焦带电粒子成像系统
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Application No.: US14228191Application Date: 2014-03-27
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Publication No.: US09099282B2Publication Date: 2015-08-04
- Inventor: Steven R. Rogers , Rainer K. Knippelmeyer , Thomas Kemen , Stefan Schubert , Nissim Elmaliah
- Applicant: Applied Materials Israel, Ltd. , Carl Zeiss SMT GMBH
- Applicant Address: IL Rehovot
- Assignee: APPLIED MATERIALS ISRAEL, LTD.
- Current Assignee: APPLIED MATERIALS ISRAEL, LTD.
- Current Assignee Address: IL Rehovot
- Agency: Lowenstein Sandler LLP
- Main IPC: H01J37/09
- IPC: H01J37/09 ; H01J37/26 ; H01J37/153 ; H01J37/21 ; H01J37/22 ; H01J37/28 ; H01J37/29

Abstract:
A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one non-astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.
Public/Granted literature
- US20140224985A1 FOCUSING A CHARGED PARTICLE IMAGING SYSTEM Public/Granted day:2014-08-14
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