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Invention Grant
US09102901B2 Methods and compositions for removal of metal hardmasks 有权
用于去除金属硬掩模的方法和组合物

Methods and compositions for removal of metal hardmasks
Abstract:
The invention provides a process for removing a film from a substrate, said process comprising applying a composition to the film, and wherein the composition comprises at least the following: a) water; and b) at least one compound selected from the following compounds (i-v): i) NR4HF2 (Formula 1), wherein R═H, alkyl, substituted alkyl, ii) NR4F (Formula 2), wherein R═H, alkyl, substituted alkyl, iii) HF (hydrofluoric acid), iv) H2SiF6 (hexafluorosilicic acid), or v) combinations thereof. The invention also provides a composition comprising at least the following: a) water; and b) at least one compound selected from the following compounds (i-v): i) NR4HF2 (Formula 1), wherein R═H, alkyl, substituted alkyl, ii) NR4F (Formula 2), wherein R═H, alkyl, substituted alkyl, iii) HF (hydrofluoric acid), iv) H2SiF6 (hexafluorosilicic acid), or v) combinations thereof.
Abstract(Chinese):

本发明提供了一种从基材中除去膜的方法，所述方法包括将组合物施加到膜上，并且其中所述组合物至少包含以下物质：a）水; 和b）至少一种选自以下化合物（iv）的化合物：i）NR 4 HF 2（式1），其中R = H，烷基，取代的烷基，ii）NR 4 F（式2），其中R = H，烷基， 烷基，iii）HF（氢氟酸），iv）H 2 SiF 6（六氟硅酸）或v）其组合。 本发明还提供至少包含以下物质的组合物：a）水; 和b）至少一种选自以下化合物（iv）的化合物：i）NR 4 HF 2（式1），其中R = H，烷基，取代的烷基，ii）NR 4 F（式2），其中R = H，烷基， 烷基，iii）HF（氢氟酸），iv）H 2 SiF 6（六氟硅酸）或v）其组合。

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