Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US14376901Application Date: 2013-01-28
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Publication No.: US09105446B2Publication Date: 2015-08-11
- Inventor: Yasushi Ebizuka , Seiichiro Kanno , Makoto Nishihara , Masashi Fujita
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2012-025676 20120209
- International Application: PCT/JP2013/051693 WO 20130128
- International Announcement: WO2013/118594 WO 20130815
- Main IPC: H01J37/30
- IPC: H01J37/30 ; H01J37/22 ; H02N13/00 ; H01J37/28 ; H01J37/20

Abstract:
An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.
Public/Granted literature
- US20150097123A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2015-04-09
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