Invention Grant
- Patent Title: Method and apparatus for detecting buried defects
- Patent Title (中): 检测埋藏缺陷的方法和装置
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Application No.: US14230987Application Date: 2014-03-31
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Publication No.: US09116109B2Publication Date: 2015-08-25
- Inventor: Hong Xiao , Ximan Jiang
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Okamoto & Benedicto LLP
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G01N23/225 ; H01J37/28 ; H01J37/26

Abstract:
One embodiment relates to a method of detecting a buried defect in a target microscopic metal feature. An imaging apparatus is configured to impinge charged particles with a landing energy such that the charged particles, on average, reach a depth within the target microscopic metal feature. In addition, the imaging apparatus is configured to filter out secondary electrons and detect backscattered electrons. The imaging apparatus is then operated to collect the backscattered electrons emitted from the target microscopic metal feature due to impingement of the charged particles. A backscattered electron (BSE) image of the target microscopic metal feature is compared with the BSE image of a reference microscopic metal feature to detect and classify the buried defect. Other embodiments, aspects and features are also disclosed.
Public/Granted literature
- US20140319340A1 METHOD AND APPARATUS FOR DETECTING BURIED DEFECTS Public/Granted day:2014-10-30
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