Invention Grant
US09120952B2 Polymeric microgels for chemical mechanical planarization (CMP) processing
有权
用于化学机械平面化(CMP)处理的聚合物微凝胶
- Patent Title: Polymeric microgels for chemical mechanical planarization (CMP) processing
- Patent Title (中): 用于化学机械平面化(CMP)处理的聚合物微凝胶
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Application No.: US11926826Application Date: 2007-10-29
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Publication No.: US09120952B2Publication Date: 2015-09-01
- Inventor: Vinay Gupta , Ashok Kumar , Cecil Coutinho , Subrahmanya Mudhivarthi
- Applicant: Vinay Gupta , Ashok Kumar , Cecil Coutinho , Subrahmanya Mudhivarthi
- Applicant Address: US FL Tampa
- Assignee: University of South Florida
- Current Assignee: University of South Florida
- Current Assignee Address: US FL Tampa
- Agency: Smith & Hopen, P.A.
- Agent Robert J. Varkonyi
- Main IPC: C09G1/02
- IPC: C09G1/02 ; H01L21/3105

Abstract:
Organic-inorganic composites were prepared as colloidal particles of a cross-linked, thermally responsive polymer. Hybrid PNIPAM-polysiloxane particles and composite polymeric particles with embedded nanoparticles of an inorganic metal-oxide (MOx) such as CeO2 and TiO2 were formed. To promote the incorporation of unaggregated nanoparticles, temperature responsive microspherical gels (microgels) of N-isopropylacrylamide (NIPAM) with interpenetrating (IP) linear chains of poly(acrylic acid) (PAA) were used. The organic-inorganic composition of the hybrid polymer network was controlled by changing the time for condensation and hydrolysis of the siloxane monomer during synthesis. Experimental results indicated that the planarization of silicon oxide wafers using these hybrid particles and composites exhibited lower topographical variations and surface roughness as compared to slurries consisting of only silica or ceria nanoparticles while achieving similar removal rates and better or similar frictional characteristics.
Public/Granted literature
- US20090013609A1 Polymeric Microgels for Chemical Mechanical Planarization (CMP) Processing Public/Granted day:2009-01-15
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