Invention Grant
- Patent Title: Specimen potential measuring method, and charged particle beam device
- Patent Title (中): 试样电位测量方法和带电粒子束装置
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Application No.: US13383546Application Date: 2010-07-02
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Publication No.: US09129775B2Publication Date: 2015-09-08
- Inventor: Tatsuaki Ishijima , Osamu Nasu , Muneyuki Fukuda , Takeyoshi Ohashi , Hiromasa Yamanashi , Takuji Miyamoto , Kei Sakai
- Applicant: Tatsuaki Ishijima , Osamu Nasu , Muneyuki Fukuda , Takeyoshi Ohashi , Takuji Miyamoto , Kei Sakai
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2009-166271 20090715
- International Application: PCT/JP2010/004346 WO 20100702
- International Announcement: WO2011/007517 WO 20110120
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/20 ; H01J37/28 ; G01R29/24 ; H01L21/66

Abstract:
The present invention has an object to perform specimen charge measurement or focusing at a high speed and with high precision also for a specimen in which fixed charge and induced charge may be mixedly present.As one mode to achieve the object, there are proposed a specimen potential measuring method and a device to implement the method characterized in that when specimen potential information obtained by a first specimen potential measuring device disposed outside a specimen chamber or specimen potential information beforehand obtained is equal to or more than a predetermined threshold value or is more than the threshold value, measurement of specimen potential is selectively conducted by use of a second specimen potential measuring device in the specimen chamber.
Public/Granted literature
- US20120119085A1 SPECIMEN POTENTIAL MEASURING METHOD, AND CHARGED PARTICLE BEAM DEVICE Public/Granted day:2012-05-17
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