Invention Grant
- Patent Title: Charged particle beam writing apparatus and irradiation time apportionment method of charged particle beams for multiple writing
- Patent Title (中): 带电粒子束写入装置和多次写入的带电粒子束的照射时间分配方法
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Application No.: US13932392Application Date: 2013-07-01
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Publication No.: US09141750B2Publication Date: 2015-09-22
- Inventor: Jun Yashima , Akihito Anpo , Yasuo Kato
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-154457 20120710
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01J37/317 ; H01J37/302 ; B82Y10/00 ; B82Y40/00
Abstract:
A beam writing apparatus includes a unit to obtain a specific value by calculating an integer by dividing a total irradiation time by a multiplied value of a region number and a repeating times number, and by multiplying the integer by the repeating times number, to add the repeating times number to the specific value when a region is in the multiple writing unit regions and is not a specific region and when a region number of the multiple writing unit region, defined excluding the specific region, is below or equal to a value obtained by dividing the total irradiation time by the multiplied value of the region number and the repeating times number, to obtain a first remainder, and dividing the first remainder by the repeating times number, and to treat an added value of the repeating times number and the specific value, as a total irradiation time.
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