Invention Grant
- Patent Title: System and method of simultaneously fueling and mitigating debris for a plasma-based illumination source
- Patent Title (中): 同时加油和减轻等离子体照明光源碎片的系统和方法
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Application No.: US13647826Application Date: 2012-10-09
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Publication No.: US09155180B1Publication Date: 2015-10-06
- Inventor: Karl R. Umstadter
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H05H1/00
- IPC: H05H1/00 ; H01J27/08 ; G03F7/20 ; H01J17/30

Abstract:
The disclosure is directed to a system and method of fueling and mitigating debris for an illumination source. An illumination system may include a plasma-based illumination source. The illumination system may provide illumination along an illumination path emanating from an illumination origin of the illumination source. A gas jet nozzle may be disposed at a selected distance from the illumination origin or proximate to the illumination origin. The gas jet nozzle may be configured to provide fuel gas to fuel the plasma-based illumination source. The gas jet nozzle may be further configured to provide fuel gas in a selected direction substantially opposite to a direction of illumination emanating from the illumination origin to remove at least a portion of debris from the illumination path.
Information query