Invention Grant
- Patent Title: Patterning via optical-saturable transitions
- Patent Title (中): 通过光学饱和转换进行图案化
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Application No.: US12749960Application Date: 2010-03-30
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Publication No.: US09164369B2Publication Date: 2015-10-20
- Inventor: Rajesh Menon , Trisha L. Andrew , Francesco Stellacci
- Applicant: Rajesh Menon , Trisha L. Andrew , Francesco Stellacci
- Applicant Address: US MA Cambridge
- Assignee: Massachusettes Institute of Technology
- Current Assignee: Massachusettes Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Gesmer Updegrove LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03B27/00
Abstract:
An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.
Public/Granted literature
- US20100248159A1 PATTERNING VIA OPTICAL-SATURABLE TRANSISIONS Public/Granted day:2010-09-30
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