Invention Grant
- Patent Title: Stage apparatus and sample observation apparatus
- Patent Title (中): 舞台装置和样品观察装置
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Application No.: US14411286Application Date: 2013-04-12
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Publication No.: US09171695B2Publication Date: 2015-10-27
- Inventor: Yasuyuki Momoi , Shigeru Haneda , Naoki Sakamoto , Masashi Shibahara , Akito Tanokuchi
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2012-142592 20120626
- International Application: PCT/JP2013/061009 WO 20130412
- International Announcement: WO2014/002579 WO 20140103
- Main IPC: H01J37/20
- IPC: H01J37/20 ; G02B21/26 ; G05D3/12 ; H01J37/28 ; G02B21/06 ; H01J37/29

Abstract:
In order to provide a stage apparatus with high speed stability in addition to being able to achieve positioning with a high degree of accuracy, and a sample observation apparatus, such as an optical microscope and a scanning electron microscope, including the stage apparatus, the stage apparatus and the sample observation apparatus of the present invention correct a command voltage value of standard waveform data or an output timing of a command voltage value such that a difference between a first time history response and a second time history response is reduced to zero, the first time history response for displacement or speed when the stage mechanism is driven with use of the standard waveform data showing the command voltage value at each predetermined time and the second time history response for displacement or speed when a speed of the stage mechanism is constant, to be set as drive waveform data to be outputted to a drive unit of the stage mechanism.
Public/Granted literature
- US20150206704A1 Stage Apparatus and Sample Observation Apparatus Public/Granted day:2015-07-23
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